Date of Publication: 28-Apr-2018
FIELD EMISSION STUDIES OF NITROGEN DOPED DIAMOND LIKE CARBON FILMS DEPOSITED BY ELECTROLYSIS OF ORGANIC LIQUID
Author: S. Kundoo* S. Kar*
Category: Engineering, Science and Mathematics
The aim of the work was to deposit amorphous Nitrogen doped diamond like carbon (a:N-DLC) films by electrodeposition process and to study the field emission properties of the films with different nitrogen content. a:N-DLC films were deposited on Si (400) substrates by electrolysis of methanol-urea solution under high voltage, at atmospheric pressure and at temperature below 350 K. The compositional analysis of the films was done by X-ray photoelectron spectroscopy (XPS). Bonding informations of the films were also obtained from Fourier transform infrared spectroscopy (FTIR) measurements. The results showed that the incorporated nitrogen was chemically bonded to carbon with C-N and C=N bonds. Nitrogen content in the films was varied from 3.5 to 6.0 at.% with the increase of urea concentration in the solution. Hardness values of the films were in the range of 11-15 Gpa. It was found that turn-on field and effective emission barrier were greatly reduced by N doping in DLC. The lowest turn-on field was obtained as 6.97 V/mm.
Keywords: Electrodeposition; Diamond like carbon; N doping; XPS; Field emission.